Substrate and method for modifying at least one region of a surface or a portion of a substrate
AssigneeSchott AG
InventorsClemens Ottermann, Frederick Bachhuber, Stefan Weidlich
Life of this patent
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Abstract
A method for physically modifying at least one of at least one region of a surface of a substrate and at least one portion of the substrate, the substrate comprising a multicomponent glass, the method comprising the steps of: providing an apparatus and the substrate, the apparatus including a radiation source configured for generating a particle beam; feeding the substrate to the apparatus and applying a vacuum; modifying at least one of the at least one region of the surface of the substrate and the at least one portion of the substrate by an exposure to the particle beam.
Claims24
A method for physically modifying at least one of at least one region of a surface of a substrate and at least one portion of the substrate, the substrate comprising a multicomponent glass, the method comprising the steps of:
- providing an apparatus and the substrate, the apparatus including a radiation source configured for generated a particle beam;
- feeding the substrate to the apparatus and applying a vacuum;
- modifying at least one of the at least one region of the surface of the substrate and the at least one portion of the substrate by an exposure to the particle beam with the result that the substrate includes at least one modified region which has a Total Thickness Variation (TTV) of <=1 μm, the method further including measuring a thickness distribution or a thickness profile of the substrate before the step of modifying in order to obtain a plurality of specifications for the step of modifying.
A substrate, comprising:
- a multicomponent glass, which is produced or configured for being produced by a method for physically modifying at least one of at least one region of a surface of the substrate and at least one portion of the substrate, the method comprising the steps of:
- providing an apparatus and the substrate, the apparatus including a radiation source configured for generating a particle beam;
- feeding the substrate to the apparatus and applying a vacuum;
- modifying at least one of the at least one region of the surface of the substrate and the at least one portion of the substrate by an exposure to the particle beam with the result that the substrate includes at least one modified region which has a Total Thickness Variation (TTV) of <=1 μm, the method further including measuring a thickness distribution or a thickness profile of the substrate before the step of modifying in order to obtain a plurality of specifications for the step of modifying.
A method of using a substrate, the method comprising the steps of:
- providing that the substrate includes a multicomponent glass, wherein the multicomponent glass is produced or configured for being produced by a method for physically modifying at least one of at least one region of a surface of the substrate and at least one portion of the substrate, the method for physically modifying comprising the steps of:
- providing an apparatus and the substrate, the apparatus including a radiation source configured for generating a particle beam;
- feeding the substrate to the apparatus and applying a vacuum;
- modifying at least one of the at least one region of the surface of the substrate and the at least one portion of the substrate by an exposure to the particle beam with the result that the substrate includes at least one modified region which has a Total Thickness Variation (TTV) of <=1 μm, the method further including measuring a thickness distribution or a thickness profile of the substrate before the step of modifying in order to obtain a plurality of specifications for the step of modifying;
- and
- using the substrate for at least one application in a field of augmented reality.
Dependencies are inferred from the claim text.