Photometric process measurement arrangement and a method for performing a photometric measurement
AssigneeHach Lange GmbH
InventorsAndre Naggies, Axel Leyer, Robert Dalljo
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AssigneeHach Lange GmbH
InventorsAndre Naggies, Axel Leyer, Robert Dalljo
Estimating the term…
The invention refers to a photometric process measurement arrangement (10) with a photometric immersion probe (20). The photometric immersion probe (20) comprises a photometer flashlight source (61) for providing photometric light impulses, a photometric detector arrangement (70) comprising at least two separate wavelength-selective detection elements (71, 72, 73), and a photometer control (80) controlling the photometer flashlight source (61) and the detector arrangement (70). The photometer control (80) comprises several impulse signal integrators (819, 829, 839) for integrating the electric impulses generated by the detection elements (71, 72, 73), several A/D-converters (81, 82, 83) for converting the voltages of the impulse signal integrators (819, 829, 839) when high-precision-converting trigger ports (H) of the A/D-converters (81, 82, 83) are triggered, and a measuring cycle control (90) with an integration target memory (94) memorizing an integration target voltage value (Ut). The photometer control (80) is provided with a high-precision-request port (93) for synchronously triggering the high-precision-converting trigger ports (H) of all A/D-converters (81, 82, 83) after the voltage of the first of all impulse signal integrators (819, 829, 839) has exceeded the memorized integration target voltage value (Ut).
A photometric process measurement arrangement with a photometric immersion probe;
Dependencies are inferred from the claim text.