Production method for etching liquid composition

An etching method comprising:

• filling a container with an etchant composition by using a filling nozzle with a filling port through which the etchant composition is discharged,
• etching a metal film that is disposed on a substrate with the etchant composition,
• wherein the etchant composition contains phosphoric acid, nitric acid, organic acid, an etching inhibitor, and water,
• wherein a raw material of the filling port of the filling nozzle is at least one selected from the group consisting of polypropylene, perfluoroalkoxyalkane, and polytetrafluoroethylene,
• wherein a receding contact angle of the etchant composition with respect to the raw material of the filling port of the filling nozzle is 66° or more, and a ratio of an advancing contact angle to a receding contact angle (advancing contact angle/receding contact angle) of the etchant composition is 1.4 or less, and
• wherein the metal film contains at least one metal selected from the group consisting of tungsten, tantalum, zirconium, hafnium, molybdenum, niobium, ruthenium, osmium, rhenium, rhodium, copper, nickel, cobalt, titanium, titanium nitride, alumina, aluminum, and iridium.

A method for producing an etchant composition, comprising:

• mixing phosphoric acid, nitric acid, organic acid, an etching inhibitor, and water to produce the etchant composition, and
• filling a container with the etchant composition by using a filling nozzle with a filling port through which the etchant composition is discharged,
• wherein the etchant composition contains the phosphoric acid, the nitric acid, the organic acid, the etching inhibitor, and water,
• wherein a raw material of the filling port of the filling nozzle is at least one selected from the group consisting of polypropylene, perfluoroalkoxyalkane, and polytetrafluoroethylene, and
• wherein a receding contact angle of the etchant composition with respect to the raw material of the filling port of the filling nozzle is 66° or more, and a ratio of an advancing contact angle to a receding contact angle (advancing contact angle/receding contact angle) of the etchant composition is 1.4 or less.