Multi-target design for in-situ analysis of semiconductor fabrication process
AssigneeApplied Materials, Inc.
InventorsYudong Hao, Todd J. Egan
Life of this patent
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Abstract
A system can provide in-situ analysis of at least some of a plurality of targets simultaneously during a fabrication process. The system can include a semiconductor processing tool having a chamber. The system can also include a sample arranged within the chamber, the sample having the plurality of targets with different feature orientations and/or feature geometries. The semiconductor processing tool can be configured to perform the fabrication process on the sample. Additionally, the system can include a metrology tool integrated with the semiconductor processing tool. The metrology tool can provide the in-situ analysis of at least some of the plurality of targets simultaneously during the fabrication process.
Claims20
A system comprising:
- a semiconductor processing tool;
- a substrate arranged within a chamber of the semiconductor processing tool, the substrate having a plurality of targets on a surface thereof, the plurality of targets having structures with multiple different feature orientations and/or feature geometries, the semiconductor processing tool configured to perform a fabrication process on the substrate, and the plurality of targets used for analysis of the fabrication process;
- and
- a metrology tool integrated with the semiconductor processing tool, wherein the metrology tool is configured to provide simultaneous in-situ optical analysis of multiple targets of the plurality of targets during the fabrication process by capturing spectroscopic emissions from the multiple targets through a single set of collection optics and associating specific pixels or regions of an imaging sensor with each respective target of the multiple targets based on a spatial distribution of the plurality of targets on the surface of the substrate.
A method comprising:
- arranging a substrate within a chamber of a semiconductor processing tool, the substrate having a plurality of targets on a surface thereof, the plurality of targets having structures with multiple different feature orientations and/or feature geometries;
- performing a fabrication process on the substrate, the plurality of targets used for analysis of the fabrication process;
- and
- providing, by a metrology tool integrated with the semiconductor processing tool, simultaneous optical analysis of multiple targets of the plurality of targets during the fabrication process by capturing spectroscopic emissions from the multiple targets through a single set of collection optics and associating specific pixels or regions of an imaging sensor with each respective target of the multiple targets based on a spatial distribution of the plurality of targets on the surface of the substrate.
Dependencies are inferred from the claim text.