Display device, method for manufacturing display device, display module, and electronic device

A method for manufacturing a display device, comprising:

• forming a first pixel electrode and a second pixel electrode over an insulating surface;
• forming a first EL film and a first sacrificial film in sequence over the first pixel electrode and over the second pixel electrode;
• processing the first sacrificial film and the first EL film to form a first sacrificial layer and a first EL layer, respectively, which include a region overlapping with the first pixel electrode;
• forming a first protective film covering at least a side surface of the first EL layer and a side surface and a top surface of the first sacrificial layer;
• processing the first protective film to form a first protective layer comprising a region overlapping with the side surface of the first EL layer;
• forming a second EL film and a second sacrificial film in sequence over the first sacrificial layer and over the second pixel electrode;
• processing the second sacrificial film and the second EL film to form a second sacrificial layer and a second EL layer, respectively, which include a region overlapping with the second pixel electrode;
• forming a second protective film covering at least a top surface of the first sacrificial layer, a top surface and a side surface of the second sacrificial layer, a side surface of the first protective layer, and a side surface of the second EL layer;
• forming an insulating film over the second protective film;
• processing the insulating film to form an insulating layer between the first EL layer and the second EL layer;
• processing the second protective film to form a second protective layer between the first protective layer and the insulating layer and between the second EL layer and the insulating layer;
• forming a third protective film over the first sacrificial layer, over the second sacrificial layer, and over the insulating layer;
• processing the third protective film to form a third protective layer over the insulating layer;
• removing the first sacrificial layer and the second sacrificial layer;
• and
• forming a common electrode over the first EL layer, over the second EL layer, and over the third protective layer.