Display device and method of fabricating the same

A method of fabricating a display device, comprising:

• forming a first pixel electrode and a second pixel electrode on a substrate, the first pixel electrode and the second pixel electrode are arranged to be spaced apart from each other, a sacrificial layer is disposed on the first pixel electrode and the second pixel electrode, an inorganic insulating layer is disposed on the sacrificial layer, and a plurality of first metal layers and a plurality of second metal layers are alternately stacked on the inorganic insulating layer;
• forming a first hole that does not overlap the first pixel electrode and the second pixel electrode and penetrates at least some of the plurality of first metal layers and at least some of the plurality of second metal layers, and a second hole that penetrates the plurality of first metal layers and the plurality of second metal layers to expose a portion of the sacrificial layer on the first pixel electrode;
• removing the sacrificial layer by wet etching the sacrificial layer and sidewalls of each of the first hole and the second hole to form metal tips in each of the plurality of first metal layers that protrude beyond sidewalls of each of the second metal layers;
• and
• forming a first light-emitting layer and a first common electrode on the first pixel electrode in a first opening that is obtained from the wet etching of the second hole, the first opening defining a first light emission area, and forming a first capping layer on the first common electrode, the first metal layers, and the second metal layers,
• wherein a side surface of the metal tip of a lowermost layer of the plurality of first metal layers positioned on a sidewall of the first opening is directly covered by the first light-emitting layer.

An electronic device, comprising:

• a display device comprising:
• a first pixel electrode and a second pixel electrode disposed on a substrate and arranged to be spaced apart from each other;
• an inorganic insulating layer disposed on the substrate and partially overlapping the first pixel electrode and the second pixel electrode;
• a metal layer structure disposed on the inorganic insulating layer and including a first opening overlapping the first pixel electrode and defining a first light emission area and a second opening overlapping the second pixel electrode and defining a second light emission area;
• a first light-emitting layer and a second light-emitting layer disposed on the first pixel electrode and the second pixel electrode, respectively;
• and
• a first common electrode and a second common electrode disposed on the first light-emitting layer and the second light-emitting layer, respectively,
• wherein
• the metal layer structure includes a plurality of first metal layers and a plurality of second metal layers that are alternately stacked with each other, wherein the first metal layers comprise uppermost and lowermost layers of the alternately stacked plurality of first and second metal layers, and
• each of the plurality of first metal layers includes metal tips that protrude beyond the plurality of second metal layers and are positioned on sidewalls of each of the first opening and the second opening,
• wherein side surfaces of the metal tip of a lowermost layer of the plurality of first metal layers positioned on the sidewalls of the first and second openings are directly covered by the first-light emitting layer and the second-light emitting layer, respectively.