Image sensor and manufacturing method of image sensor

An image sensor comprising:

• a substrate comprising:
• a first surface;
• a second surface facing the first surface;
• and
• a plurality of pixel regions disposed along a first direction and a second direction different from the first direction;
• and
• a plurality of ground regions that are disposed within a portion of the substrate along a depth direction perpendicular to the first direction and the second direction from the first surface of the substrate;
• a deep trench that extends from the first surface of the substrate to the second surface of the substrate and defines the plurality of pixel regions within the substrate;
• and
• a shallow trench that extends into the portion of the substrate along the depth direction from the first surface of the substrate and is disposed at an outer edge of at least a portion of the deep trench, the shallow trench having a depth that is less than a depth of the deep trench;
• wherein on a plane where the first direction and the second direction intersect, the deep trench and the shallow trench are disposed between two ground regions of the plurality of ground regions disposed along the first direction and the deep trench is disposed between two ground regions of the plurality of ground regions disposed along the second direction.