Systems and methods for recovering organic contaminants from semiconducting wafers

A method for scanning a surface of a semiconducting wafer

• for organic contaminants utilizing a nozzle, comprising:
• positioning a nozzle above a surface of a semiconducting wafer, the semiconducting wafer supported adjacent to or within an interior of a chamber body;
• introducing a first scan fluid including one or more organic solvents to an inlet port of the nozzle;
• directing a portion of the first scan fluid onto the surface of the semiconducting wafer to permit interaction between the first scan fluid and one or more organic contaminants present on the surface of the semiconducting wafer;
• while directing the portion of the first scan fluid onto the surface of the semiconducting wafer, introducing a second portion of the first scan fluid to the nozzle to replenish a volume of the first scan fluid on the surface of the semiconducting wafer;
• removing the first scan fluid containing at least a portion of the one or more organic contaminants from the surface of the semiconducting wafer via the nozzle;
• transferring the first scan fluid removed from the surface of the semiconducting wafer via the nozzle to a collection vessel;
• introducing a second scan fluid including one or more organic solvents to the inlet port of the nozzle;
• directing a portion of the second scan fluid onto the surface of the semiconducting wafer to permit interaction between the second scan fluid and one or more residual organic contaminants present on the surface of the semiconducting wafer following
• the first scan fluid removal;
• removing the second scan fluid containing at least a portion of the one or more residual organic contaminants from the surface of the semiconducting wafer via the nozzle;
• transferring the second scan fluid removed from the surface of the semiconducting wafer via the nozzle to the collection vessel to mix with the first scan fluid removed from the surface of the semiconducting wafer and provide a combined scan sample;
• and transferring the combined scan sample to an analysis system for determination of a composition of one or more of the one or more organic contaminants or the one or
• more residual organic contaminants.