Supporting unit and apparatus for treating substrate

A substrate treating apparatus comprising:

• a chamber providing a treating space for treating a substrate therein;
• a support unit configured to support the substrate in the treating space;
• and
• a plasma source configured to generate a plasma for treating the substrate at the treating space, and
• wherein the support unit comprises:
• heating elements configured to control a temperature of the substrate, the heating elements being independently operable;
• a power supply module configured to generate at least two powers having a different frequency;
• power supply lines connecting the power supply module to the heating elements;
• power return lines connecting the heating elements to a ground;
• filters installed at the power supply lines,
• wherein the power supply module comprises:
• a power source:
• a plurality of frequency conversion members connected to the power source and configured to convert a power generated by the power source to a power having a specific frequency;
• a plurality of switches respectively corresponding to the plurality of frequency conversion members;
• and
• a frequency synthesizing member selectively connectable to the plurality of frequency conversion members, the frequency synthesizing member configured to synthesize the power of the specific frequency from at least one selectively connected frequency conversion member.