Method for manufacturing low-emissivity easy-clean glass, low-emissivity easy-clean glass, and low-emissivity easy-clean composite glass
AssigneeZirco Applied Materials Co., Ltd.
InventorShiou-Sheng Yang
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Abstract
A method for manufacturing low-emissivity easy-clean glass and the resulting low-emissivity easy-clean glass and low-emissivity easy-clean composite glass. The method involves using RF (Radio Frequency) sputtering of a silicon oxide target while simultaneously introducing nitrogen gas, and simultaneously using DC (Direct Current) sputtering of a silver target to co-deposit nitrogen-doped silicon oxide silver (Si, O, N: Ag) on a clear glass substrate. This low-emissivity easy-clean glass can avoid oxidation issues, improve conductivity, hardness, water contact angle, and reduce hemispherical emissivity.
Claims20
A low-emissivity easy-clean glass, comprising:
- a first nitrogen-doped silicon oxide silver layer (21);
- and
- a glass substrate (10) on which the first nitrogen-doped silicon oxide silver layer (21) is formed.
A method for manufacturing low-emissivity easy-clean glass, comprising:
- using RF (Radio Frequency) sputtering of a silicon oxide target while simultaneously introducing nitrogen gas and using DC (Direct Current) sputtering of a silver target to co-deposit nitrogen-doped silicon oxide silver (Si, O, N:
- Ag) on a glass substrate.
Dependencies are inferred from the claim text.