Plasma-resistant glass and manufacturing method thereof
AssigneesIones Co., Ltd., Korea Institute of Ceramic Engineering and Technology
InventorsDae Gean Kim, Hye Won Seok, Mun Ki Lee, Hyeong Jun Kim
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Abstract
The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.
Claims16
A plasma-resistant glass comprising 32 to 52 mol % of SiO2, 5 to 15 mol % of Al2O3, 30 to 55 mol % of CaO, and 0.1 to 15 mol % of CaF2 as chemical components, and
- wherein the plasma-resistant glass consists of an amorphous structure, and wherein the CaO and the CaF2 have a molar ratio of 4:1 to 9:1.
A method for manufacturing a plasma-resistant glass, the method comprising:
- preparing a plasma-resistant glass raw material by mixing SiO2 powder, a Al2O3 precursor, a CaO precursor, and CaF2 powder;
- melting the plasma-resistant glass raw material in an oxidizing atmosphere;
- rapidly cooling the melt;
- heat-treating the rapidly cooled resultant product at a temperature higher than the glass transition temperature;
- and
- annealing the heat-treated resultant product to obtain a plasma-resistant glass, wherein the plasma-resistant glass includes 32 to 52 mol % of SiO2, 5 to 15 mol % of Al2O3, 30 to 55 mol % of CaO, and 0.1 to 15 mol % of CaF2 as chemical components, and
- wherein the plasma-resistant glass consists of an amorphous structure, and wherein the CaO and the CaF2 have a molar ratio of 4:1 to 9:1.
Dependencies are inferred from the claim text.