Water supply system
AssigneeDisco Corporation
InventorVan Tuan Dang
Life of this patent
Estimating the term…
Abstract
A water supply system for supplying water to be used in a processing apparatus includes a water producing apparatus and a water adjusting apparatus. The water producing apparatus includes a first ion exchange resin column containing first ion exchange resin with which the water makes contact, and a first specific resistance meter for measuring a specific resistance of the water having made contact with the first ion exchange resin. The water adjusting apparatus includes a second ion exchange resin column containing second ion exchange resin with which the water supplied from the water producing apparatus makes contact, and a second specific resistance meter for measuring a specific resistance of the water having made contact with the second ion exchange resin.
Claims8
A water supply system for supplying water to be used in a processing apparatus, the water supply system comprising:
- a water producing apparatus including a first inlet and a first outlet, a first ion exchange resin column connected to the first inlet and containing first ion exchange resin, wherein water received from the first inlet contacts the first ion exchange resin in the first ion exchange resin column, and a first specific resistance meter measures a specific resistance of the water having made contact with the first ion exchange resin, and when a first resistance of the water measured by the first specific resistance meter is at or greater than a first predetermined threshold level, the water exits the first specific resistance meter and moves through the first outlet;
- and
- a water adjusting apparatus including a second inlet and a second outlet, wherein the second inlet receives the water from the first outlet, a second ion exchange resin column connected to the second inlet and containing second ion exchange resin, wherein the water received from the second inlet contacts the second ion exchange resin in the second ion exchange resin column, and a second specific resistance meter measures a specific resistance of the water having made contact with the second ion exchange resin, and when a second resistance of the water measured by the second specific resistance meter is at or greater than a second predetermined threshold level, the water exits the second specific resistance meter and is supplied to a processing apparatus.
Dependencies are inferred from the claim text.