Polishing pad conditioning apparatus
AssigneeHangzhou Sizone Electronic Technology Inc.
InventorsHongxiu He, Yuansi Yang, Zhipeng Zhou
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AssigneeHangzhou Sizone Electronic Technology Inc.
InventorsHongxiu He, Yuansi Yang, Zhipeng Zhou
Estimating the term…
Disclosed in the present invention is a polishing pad conditioning apparatus, comprising: a connecting arm that horizontally extends; a finishing head unit, provided at one end of the connecting arm and used for finishing a polishing pad; and a base unit, provided at the other end of the connecting arm, movably connected to the connecting arm, and used for driving the connecting arm to drive the finishing head unit to vertically move up and down, so that the finishing head unit is close to or far away from the polishing pad in a direction tending to be perpendicular to the polishing pad. The present invention can stably achieve uniform and stable positive pressure in a finishing process and ensure the consistency of a polishing finishing process.
A polishing pad conditioning apparatus, comprising:
Dependencies are inferred from the claim text.