Feeding apparatus and substrate processing device
AssigneeContemporary Amperex Technology Co., Limited
InventorsYongqiang Xu, Junna Shi, Yu Chen, Keqiang Li, Zhiyang Wu, Weifeng Chen, Jiabao Tang
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AssigneeContemporary Amperex Technology Co., Limited
InventorsYongqiang Xu, Junna Shi, Yu Chen, Keqiang Li, Zhiyang Wu, Weifeng Chen, Jiabao Tang
Estimating the term…
A feeding apparatus and a substrate processing device are provided. The feeding apparatus includes: a material conveying channel including a feeding inlet and a discharging outlet, where the feeding inlet is closer to a first end of the material conveying channel than the discharging outlet, and the discharging outlet is closer to a second end of the material conveying channel than the feeding inlet, the first end and the second end being two opposite ends of the material conveying channel; and a vibration generator disposed at the material conveying channel and configured to generate mechanical vibration to induce the mechanical vibration of the feeding apparatus, and a material entering the material conveying channel through the feeding inlet is conveyed to the discharging outlet under the action of the mechanical vibration and falls out through the discharging outlet under the action of gravity.
A feeding apparatus, characterized in that the feeding apparatus is configured to supply a material for a coating process of a substrate so that the substrate coated with the material becomes an electrode plate;
Dependencies are inferred from the claim text.