Compact in-situ gas separator for substrate processing systems

A gas separator for a substrate processing system, comprising:

• a first distillation chamber;
• an evaporation chamber;
• a first liquid valve comprising an inlet in fluid communication with the first distillation chamber and an outlet in fluid communication with the evaporation chamber;
• and
• a chiller configured to chill the first distillation chamber to a first temperature and the evaporation chamber to a second temperature that is different than the first temperature,
• wherein during a first mode, the first distillation chamber is configured to receive a gas mixture comprising N gases at an inlet of the first distillation chamber, where N is an integer greater than one, to separate the gas mixture, by condensing at least one of the N gases, into a first condensed liquid and a first separated gas mixture, to store the first condensed liquid in the first distillation chamber and to supply the first separated gas mixture at a first outlet of the first distillation chamber, and
• wherein during a second mode, the first liquid valve transfers the first condensed liquid from a second outlet of the first distillation chamber to the evaporation chamber and the first distillation chamber does not receive the gas mixture via the inlet of the first distillation chamber and does not supply the first separated gas mixture via the first outlet of the first distillation chamber.