Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a batch processor configured to collectively process a lot including plural substrates and including a processing tank;
• a single-wafer processor configured to process the substrates included in the lot one by one;
• a transport portion configured to deliver the substrates one by one between the batch processor and the single-wafer processor;
• and
• a controller configured to control each part of the substrate processing apparatus,
• wherein the processing tank stores a processing liquid that includes a rinsing liquid and a low surface tension fluid in a concentration of 10% or more, wherein the low surface tension fluid has a lower surface tension than the rinsing liquid, the processing tank including an inner tank configured to receive the substrate included in the lot and an outer tank arranged around an upper portion of the inner tank,
• wherein the processing tank includes a fluid supplier and a circulator including a circulation line interconnecting the inner tank and the outer tank,
• wherein the processing liquid is circulated from the outer tank to the inner tank via the circulation line and from the inner tank to the outer tank via the processing liquid overflowing from the inner tank,
• wherein the fluid supplier comprises a fluid source storing the low surface tension fluid and a supply line interconnecting the fluid source and the outer tank, and
• wherein the controller is configured to control the fluid supplier to supply the low surface tension fluid to the outer tank to be mixed in the concentration of 10% or more with the rinsing liquid to form the processing liquid, while the transport portion is moving the substrate from the inner tank of the processing tank to the single-wafer processor in a state in which the substrates are wet by the processing liquid.