Processing method and processing system
AssigneeTokyo Electron Limited
InventorsHayato Tanoue, Yohei Yamashita, Yasutaka Mizomoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsHayato Tanoue, Yohei Yamashita, Yasutaka Mizomoto
Estimating the term…
A processing method of processing a combined substrate in which a first substrate and a second substrate are bonded to each other includes acquiring layer information of the combined substrate; forming a non-bonding region in which bonding strength between the first substrate and the second substrate is reduced, by radiating laser light in a pulse shape to a laser absorption film formed at an interface between the first substrate and the second substrate; and separating the first substrate from the second substrate. In the forming of the non-bonding region, a temperature difference between a first temperature in a laser radiation direct region including one light-converging point of the laser light and a second temperature in a laser radiation peripheral region is changed based on at least one of the acquired layer information or a position of the one light-converging point in the combined substrate in a radial direction.
A processing method of processing a combined substrate in which a first substrate and a second substrate are bonded to each other, the processing method comprising:
A processing system of processing a combined substrate in which a first substrate and a second substrate are bonded to each other,
Dependencies are inferred from the claim text.