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US 12,745,587 B2Granted
Apparatus for treating substrate
AssigneeSemes Co., Ltd.
InventorsJun Young Choi, Kyu Hwan Chang, Chul Goo Kim, Jung Bong Choi, Young Il Lee
Life of this patent
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Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid; and a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture.
Claims16
A substrate treating apparatus comprising:
- a treating bath for liquid treating a plurality of substrates and having an accommodation space for accommodating a treating liquid;
- a posture changing member for changing a posture of a substrate which is immersed in the treating liquid from a vertical posture to a horizontal posture;
- a wetting module installed above the treating bath for spraying a wetting liquid on a substrate exposed to the outside and separated from the treating liquid;
- and
- a transfer unit having a hand for transferring the substrate;
- and
- a controller,
- wherein the posture changing member comprises:
- a moving portion installed at a side portion of the treating bath and configured to move in a horizontal direction,
- a rotating portion connected to the moving portion and configured to rotate,
- a storage container which is immersed in the treating liquid accommodated at the accommodation space and having a storage space for storing substrates, and
- a lifting/lowering member for moving a substrate stored at the storage space and changed to the horizontal posture in an up/down position,
- wherein the rotating portion is configured to be mountable on the storage container for rotating the storage container,
- wherein the moving portion installed at the treating bath is configured to move the storage container mounted on the rotating portion in the horizontal direction,
- wherein a side of the storage container is opened and faces the wetting module when the storage container rotates and a posture of the substrate changes to the horizontal posture, and
- wherein the controller is configured to control the posture changing member, the lifting/lowering member, the transfer unit, and the wetting module such that
- the moving portion installed at the treating bath moves the storage container mounted on the rotating portion in the horizontal direction toward a first position where an alignment groove of the storage container is separated from a shaft of the lifting/lowering member and aligned with an upper end of the shaft of the lifting/lowering member,
- the upper end of the shaft of the lifting/lowering member is lifted up to be inserted into the alignment groove of the storage container at the first position and the rotating portion of the posture changing member is separated from the storage container at the first position such that the shaft of the lifting/lowering member moves the storage container at the first position in an upward direction to sequentially move one substrate at a time out of the treating liquid so that the substrate is exposed to the outside,
- the wetting module sprays the wetting liquid onto the substrate exposed to the outside and separated from the treating liquid, and
- the transfer unit transfers the substrate while the wetting liquid is being sprayed onto the substrate exposed to the outside.
17 more elements
A substrate treating apparatus comprising:
- a first treating part for liquid treating a plurality of substrates in a batch-type method;
- a second treating part for liquid treating or dry treating one substrate in a single-type method;
- and
- a controller,
- wherein the first treating part comprises:
- a treating bath having an accommodation space for accommodating a treating liquid;
- a wetting module installed above the treating bath for spraying a wetting liquid on a substrate exposed to an outside and away from the treating liquid;
- a posture changing member for changing a posture of a substrate immersed in the treating liquid from a vertical posture to a horizontal posture;
- a lifting/lowering member for moving a substrate changed to the horizontal posture in an upward direction so it deviates from the treating liquid accommodated at the accommodation space to be exposed to an outside;
- and
- a plurality of storage containers having a storage space for storing a substrate,
- wherein the posture changing member comprises:
- a moving portion installed at a side portion of the treating bath and configured to move in a horizontal direction, and
- a rotating portion connected to the moving portion and configured to rotate,
- wherein the posture changing member converts the stored substrates by rotating a first storage container among the plurality of storage containers to the horizontal posture,
- wherein the lifting/lowering member moves the substrate converted to the horizontal posture and stored at the first storage container to an up/down direction,
- wherein the second treating part comprises a buffer part for temporarily storing the substrate,
- wherein the first treating part further comprises a first transfer unit for transferring a substrate exposed to an outside away from the treating liquid accommodated at the accommodation space to the buffer part by the lifting/lowering member, and
- wherein the controller is configured to control the posture changing member, the lifting/lowering member, the first transfer unit, and the wetting module such that
- the moving portion installed at the side portion of the treating bath moves the first storage container mounted on the rotating portion in the horizontal direction toward a first position where an alignment groove of the first storage container is separated from a shaft of the lifting/lowering member and aligned with an upper end of the shaft of the lifting/lowering member,
- the upper end of the shaft of the lifting/lowering member is lifted up to be inserted into the alignment groove of the first storage container and the rotating portion of the posture changing member is separated from the first storage container such that the shaft of the lifting/lowering member moves the first storage container in an upward direction to sequentially move one substrate at a time out of the treating liquid so that the substrate is exposed to the outside,
- the wetting module sprays the wetting liquid onto the substrate exposed to the outside and separated from the treating liquid, and
- the first transfer unit transfers the substrate while the wetting liquid is being sprayed onto the substrate exposed to the outside.
20 more elements
A substrate treating apparatus comprising:
- a first treating part for liquid treating a plurality of substrates in a batch-type method;
- a second treating part for treating a substrate treated at the first treating part and for liquid treating or dry treating one substrate in a single-type method;
- and
- a controller configured to control the first treating part and the second treating part,
- wherein the first treating part comprises:
- a plurality of treating baths having an accommodation space for accommodating a treating liquid;
- a posture changing member for changing a posture of a substrate immersed in the treating liquid from a vertical posture to a horizontal posture,
- wherein the posture changing member comprises:
- a moving portion installed at a side portion of each treating bath of the plurality of treating baths and configured to move in a horizontal direction, and
- a rotating portion connected to the moving portion and configured to rotate;
- and
- a wetting module installed above each of the plurality of treating baths and spraying a wetting liquid to a substrate exposed to an outside and away from a treating liquid accommodated at the accommodation space,
- wherein a treating liquid accommodated at a first treating bath of among the plurality of treating baths is the same type as a wetting liquid sprayed by the wetting module,
- wherein a treating liquid accommodated at other treating bath, different from the first treating bath, among the plurality of treating baths is different from the wetting liquid sprayed by the wetting module,
- wherein the second treating part further comprises a buffer part for temporarily storing a substrate,
- wherein the first treating part comprises:
- a storage container having a storage space immersed in the treating liquid accommodated at the accommodation space and rotated by the posture changing member;
- a lifting/lowering member for moving the storage container rotated by the posture changing member in an up/down direction;
- and
- a transfer unit having a hand for transferring the substrate, and
- wherein the controller is configured to control the posture changing member, the lifting/lowering member, the transfer unit, and the wetting module such that
- the moving portion installed at the treating bath moves the storage container mounted on the rotating portion in the horizontal direction toward a first position where an alignment groove of the storage container is separated from a shaft of the lifting/lowering member and aligned with an upper end of the shaft of the lifting/lowering member,
- the upper end of the shaft of the lifting/lowering member is lifted up to be inserted into the alignment groove of the storage container at the first position and the rotating portion of the posture changing member is separated from the storage container at the first position such that the shaft of the lifting/lowering member moves the storage container in an upward direction to sequentially move one substrate at a time out of the treating liquid so that the substrate is exposed to the outside,
- the wetting module sprays the wetting liquid onto the substrate exposed to the outside and separated from the treating liquid, and
- the transfer unit transfers the substrate while the wetting liquid is being sprayed onto the substrate exposed to the outside.
22 more elements
Dependencies are inferred from the claim text.