Wafer dicing method and liquid ejection head
AssigneeCanon Kabushiki Kaisha
InventorsTakashi Teragaki, Tetsuro Yasukawa
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AssigneeCanon Kabushiki Kaisha
InventorsTakashi Teragaki, Tetsuro Yasukawa
Estimating the term…
One embodiment of the present disclosure is a stealth dicing method performed on a wafer having a first substrate, a second substrate, and a hollow portion, the second substrate being thinner than the first substrate in a region defining the hollow portion. The stealth dicing method has a first step of performing laser application on the second substrate to form a modified region in the second substrate and a second step of performing laser application on the first substrate after the first step to form a modified region in the first substrate. In either the first or second step, multiple modified regions are formed, arranged in the Z-direction at positions corresponding to both sides of the hollow portion in the Y-direction, and in the other step, multiple modified regions are formed, arranged in the Z-direction at a position corresponding to one side of the hollow portion in the Y-direction.
A stealth dicing method performed on a wafer having a first substrate, a second substrate bonded to the first substrate, and a hollow portion defined by a concave portion at least partially disposed adjacent to an interface of the first substrate and the second substrate, the second substrate being thinner than the first substrate in a region including the hollow portion, with an X-direction being a direction in which the hollow portion extends, a Z-direction being a direction of a thickness of the wafer, and a Y-direction being a direction orthogonal to the X-direction and the Z-direction, the stealth dicing method comprising:
Dependencies are inferred from the claim text.