Impurity processing device and impurity processing method
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsMiyuki Nakai, Yuko Ogawa, Toshiro Kume
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Abstract
An impurity processing device is a device for processing metal impurities contained in a solid-liquid mixture for forming an electrode of an electric storage device, and includes a first electrode and a second electrode that apply an electric field to the solid-liquid mixture, and a power supply that causes a current of 0.1 mA or more to flow between the first electrode and the second electrode.
Claims1
An impurity processing method for processing metal impurities contained in a solid-liquid mixture for forming an electrode of an electric storage device, the impurity processing method comprising:
- providing a first electrode and a second electrode configured to apply an electric field to the solid-liquid mixture,
- applying an amount of electricity of 1 C or more to the solid-liquid mixture by causing a current of 0.1 mA or more to flow between the first electrode and the second electrode via the solid-liquid mixture,
- wherein the solid-liquid mixture is an electrode slurry containing a solvent and an electrode active material,
- wherein a voltage V, in volt, between the first electrode and the second electrode at a current of 0.1 mA or more flowing between the first electrode and the second electrode, and a distance t, in mm, between the first electrode and the second electrode, and
- wherein t is greater than 0, satisfy:
- V=1.2t+3, where the solvent is a nonaqueous solvent;
- and
- V=1.15t+1.5, where the solvent is an aqueous solvent.
Dependencies are inferred from the claim text.