Sputtered film six-dimensional force sensor elastomer structure based on improved cross beam

A sputtered film six-dimensional force sensor elastomer structure based on improved cross beam, comprising beams, first floating beams, second floating beams, square corners and film strain gauges;

• wherein
• the beams are four rectangular beams each with a square section;
• the four rectangular beams are connected to each other at one end of each of the four rectangular beams to form a cross, and the other end of the each of the four rectangular beams is connected to a corresponding first floating beam;
• the first floating beams are four rectangular walled beams each with a rectangular section;
• a center of an inner side surface of each of the first floating beams is connected with each of the beams, and both ends of the each of the first floating beams are connected with the corresponding square corners;
• the second floating beams are four rectangular walled beams each with a rectangular section;
• each of the second floating beams is parallel to a horizontal part of the beams, and one end of the each of the second floating beams is connected with the beams, and the other end of the each of the second floating beams is connected with the first floating beams;
• an axis of the each of the second floating beams is located at a center between a horizontal part of beams and a horizontal part of one of the first floating beams;
• the square corners are four cuboid structures each with a square section;
• four connecting holes are formed on the square corners for fixing;
• and the beams are in the middle, the first floating beams are at the periphery, the each of the second floating beams is located between the horizontal part of the each of the beams and the horizontal part of the each of the first floating beams;
• and
• the film strain gauges are identical, the film strain gauges have the same initial resistance value, a resistance value decreases during contraction of the film strain gauges, and the resistance value increases during extension;
• a first film strain gauge of the film strain gauges and a seventh film strain gauge of the film strain gauges on a first one of the beams are sputtered separately on an upper surface of the first one of the beams and a lower surface of the first one of the beams located beside a center boss in a negative X direction, a third film strain gauge of the film strain gauges and a ninth film strain gauge of the film strain gauges on a second one of the beams are sputtered separately on an upper surface of the second one of the beams and a lower surface of the second one of the beams located beside the center boss in a positive X direction, a second film strain gauge of the film strain gauges and an eighth film strain gauge of the film strain gauges on a third one of the beams are sputtered separately on an upper surface of the third one of the beams and a lower surface of the third one of the beams away from the center boss in a positive Y direction, a fourth film strain gauge of the film strain gauges and a tenth film strain gauge of the film strain gauges on a fourth one of the beams are sputtered separately on an upper surface of the fourth one of the beams and a lower surface of the fourth one of the beams away from the center boss in a negative Y direction, a fifth film strain gauge of the film strain gauges and an eleventh film strain gauge of the film strain gauges on the second one of the beams are sputtered separately on an upper surface of the second one of the beams and a lower surface of the second one of the beams away from the center boss in the positive X direction, a sixth film strain gauge of the film strain gauges and a twelfth film strain gauge of the film strain gauges on the first one of the beams are sputtered separately on an upper surface of the first one of the beams and a lower surface of the first one of the beams away from the center boss in the negative X direction, a thirteenth film strain gauge of the film strain gauges and a fifteenth film strain gauge of the film strain gauges on a first one of the first floating beams are sputtered on an outer side surface of the first one of the first floating beams located beside the beams in the negative X direction, a fourteenth film strain gauge of the film strain gauges and a sixteenth film strain gauge of the film strain gauges on a second one of the first floating beams are sputtered on an outer side surface of the second one of the first floating beams located beside the second one of the beams in the positive X direction, a seventeenth film strain gauge of the film strain gauges and a twenty-first film strain gauge of the film strain gauges on a third one of the first floating beams are sputtered on an outer side surface of the third one of the first floating beams located beside the fourth one of the beams in the negative Y direction, a nineteenth film strain gauge of the film strain gauges and a twenty-third film strain gauge of the film strain gauges on a fourth one of the first floating beams are sputtered on an outer side surface of the fourth one of the first floating beams located beside the third one of the beams in the positive Y direction, an eighteenth film strain gauge of the film strain gauges and a twentieth film strain gauge of the film strain gauges on the first one of the first floating beams are sputtered on an outer side surface of the first one of the first floating beams located beside the second floating beam in the negative X direction, a twenty-second film strain gauge of the film strain gauges and a twenty-fourth film strain gauge of the film strain gauges on the second one of the first floating beams are sputtered on an outer side surface of the second one of the first floating beams located beside the second floating beam in the positive X direction, and all film strain gauges are sputtered at the positions where a strain is the largest when each beam is stressed.