Capacitative sensing device for in-situ monitoring of coatings

A device for monitoring deposition of a coating comprising a dielectric material during deposition of the coating, the device comprising:

• a parallel-plate capacitor comprising:
• a first plate;
• and
• a second plate;
• a first lead electrically connected to the first plate;
• a second lead electrically connected to the second plate;
• and
• a power supply,
• wherein the deposition of the coating comprises one or more chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) processes, and wherein the coating comprises a chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) coating, respectively, wherein the first plate and the second plate are parallel and separated by a spacing with a known spacing thickness, wherein the first lead and the second lead can be electrically connected to positive and negative terminals of the power supply, and wherein the device is configured to register a capacitance via a controller when the first lead and the second lead are respectively connected to the positive and the negative terminals of the power supply and a dielectric material fills the spacing, such that a thickness of the coating comprising the dielectric material is at least the spacing thickness when the capacitance is registered.