Semiconductor manufacturing apparatus, gas supplying method using the same, and semiconductor manufacturing method using the same

A method of manufacturing a semiconductor device by a semiconductor manufacturing apparatus, comprising:

• heating, using one or more heating devices of the semiconductor manufacturing apparatus, a gas tank and a gas line of the semiconductor manufacturing apparatus;
• preparing a substrate to a process chamber of the semiconductor manufacturing apparatus;
• supplying a reaction gas to the process chamber;
• and
• performing a semiconductor manufacturing process in the process chamber,
• wherein the supplying of the reaction gas comprises:
• filling, through the gas line, the gas tank with the reaction gas;
• changing, using the one or more heating devices, a temperature of the reaction gas in the gas tank;
• and
• supplying the reaction gas from the gas tank to the process chamber,
• wherein a first time length for the filling of the gas tank with the reaction gas is larger than a second time length for the supplying of the reaction gas to the process chamber.