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US 12,741,068 B2Granted
Method for manufacturing mitochondria-rich plasma
AssigneeTaiwan Mitochondrion Applied Technology Co., Ltd.
InventorsHan-Chung Cheng, Chih-Kai Hsu, Hui-Ching Tseng, An-Ling Cheng
Life of this patent
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Abstract
The embodiments of the present disclosure provide a manufacturing method of mitochondria-rich plasma. The mitochondria-rich plasma can increase the cell viability of damaged cells, decrease the cellular senescence level, repair the oxidative damage of cells, and relieve the inflammation of hair follicles so as to achieve the purpose of promoting hair regrowth.
Claims3
A method for manufacturing mitochondria-rich plasma, comprising:
- separating plasma and cells from blood;
- taking out mitochondria from the cells;
- and
- mixing the plasma and the mitochondria to form mitochondria-rich plasma;
- wherein a weight of the mitochondria in the mitochondria-rich plasma is 40 μg, a concentration (v/v %) of the plasma is 5%, and the mitochondria and the plasma are derived from the same batch of blood of the same individual,
- the mitochondria-rich plasma comprises platelets and growth factors, the growth factors comprises at least one selected from the group consisting of at least 3.1 mg/ml of TGF-β1, at least 9.5 ng/mL of PDGF-AA, at least 91.7 ng/ml of PDGF-AB, and at least 79.3 ng/ml of PDGF-BB, and a number of the platelets in the plasma is less than 1×104 per μL.
3 more elements
Dependencies are inferred from the claim text.