Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorGentaro Goshi
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AssigneeTokyo Electron Limited
InventorGentaro Goshi
Estimating the term…
A controller of a substrate processing apparatus executes: a first process in which a processing fluid is supplied to a processing container in a first period until a pressure in the processing container is increased and the processing fluid in the processing container reaches a supercritical state; a second process in which the processing fluid is supplied to the processing container at a flow rate larger than a flow rate of the processing fluid supplied to the first fluid ejector in the first process, in a second period; and a density adjustment process in which after ending of the first process and before starting of the second process, the density adjustment mechanism makes a difference between a density of the processing fluid present in the upstream region of a second opening/closing valve and a density of the processing fluid present in the processing container smaller than a predetermined threshold.
A substrate processing apparatus comprising:
A substrate processing method comprising:
Dependencies are inferred from the claim text.