Film formation method

Abstract

A film formation method of selectively forming a film on a substrate includes: a preparation process of preparing the substrate having a first film and a second film exposed on a surface thereof; a first film formation process of forming a self-assembled monolayer on the first film by supplying, onto the substrate, a compound for forming the self-assembled monolayer that has a functional group not containing fluorine and containing an alkyl group and prevents formation of a third film; a second film formation process of forming the third film on the second film; and a first removal process of removing the third film formed in a vicinity of the self-assembled monolayer by applying energy to the surface, wherein the third film is a film that is more likely than the first film to combine with hydrogen and carbon contained in the self-assembled monolayer to form a volatile compound.

Dependencies are inferred from the claim text.