Display device and manufacturing method for the same

A display device comprising:

• an insulating reflective layer comprising a distributed Bragg reflector comprising multiple pairs of layers having different respective refractive indices above a substrate;
• a first electrode and a second electrode above the insulating reflective layer;
• an insulating layer above the first electrode and the second electrode;
• and
• a light-emitting element above the insulating layer,
• wherein the insulating layer has a single-layer structure,
• wherein the insulating reflective layer comprises a first layer and a second layer, and has a structure in which the first layer and the second layer are alternately disposed, and
• wherein the insulating layer and the second layer contact each other, and comprise different respective materials such that the distributed Bragg reflector is formed.

A method for manufacturing a display device, the method comprising:

• forming a transistor comprising transistor electrodes formed on a same layer on a substrate;
• forming a via layer comprising an organic material to cover the transistor electrodes and planarize a lower step difference;
• providing a first insulating reflective layer comprising a distributed Bragg reflector comprising multiple pairs of layers having different respective refractive indices above the substrate, the first insulating reflective layer having a thickness less than a thickness of the via layer on the via layer;
• providing an alignment electrode above the first insulating reflective layer;
• providing a second insulating reflective layer comprising a distributed Bragg reflector comprising multiple pairs of layers having different respective refractive indices above the alignment electrode;
• and
• locating a light-emitting element above the second insulating reflective layer,
• wherein the providing of the first insulating reflective layer comprises forming a (1_1)th layer and forming a (1_2)th layer,
• wherein the (1_1)th layer and the (1_2)th layer form a first pair,
• wherein the providing of the second insulating reflective layer comprises forming a (2_1)th layer and forming a (2_2)th layer,
• wherein the (2_1)th layer and the (2_2)th layer form a second pair,
• wherein the (1_1)th layer and the (2_1)th layer comprise a first material,
• wherein the (1_2)th layer and the (2_2)th layer comprise a second material different from the first material, and
• wherein the second insulating reflective layer is directly disposed on the first insulating reflective layer in an area overlapping the light-emitting element along a thickness direction of the substrate.