Methods of manufacturing film bulk acoustic wave resonators
AssigneeSkyworks Solutions, Inc.
InventorsSatoru Matsuda, Hiroyuki Tahara, Jun Hashimoto, Yasuhiro Yamauchi, Hiroki Kamiguchi
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AssigneeSkyworks Solutions, Inc.
InventorsSatoru Matsuda, Hiroyuki Tahara, Jun Hashimoto, Yasuhiro Yamauchi, Hiroki Kamiguchi
Estimating the term…
Disclosed herein are embodiments of a method of manufacturing film bulk acoustic wave resonators. The method comprises forming a sacrificial layer over a surface of a substrate to form a plurality of film bulk acoustic wave resonators on the surface of the substrate, forming a piezoelectric film on the surface of the substrate to cover the sacrificial layer, and removing the sacrificial layer to form an air gap between the surface of the substrate and the piezoelectric film that has covered the sacrificial layer, the air gap corresponding to each of the plurality of film bulk acoustic wave resonators. The step of forming the piezoelectric film includes controlling a concentration distribution of an additive added to the piezoelectric film across the surface of the substrate to suppress a variation of the acoustic velocity of the piezoelectric film depending on a position on the main surface of the substrate.
A film bulk acoustic wave resonator comprising:
A film bulk acoustic wave filter assembly comprising:
A film bulk acoustic wave resonator comprising:
Dependencies are inferred from the claim text.