Focus ring, substrate processing apparatus including the same, and semiconductor fabrication method using the same

A substrate processing apparatus, comprising:

• an electrostatic chuck structure comprising a chuck that supports a substrate;
• and
• a focus ring on a lateral surface of the chuck and having a central axis that extends in a first direction,
• wherein the focus ring comprises a first outer lateral surface and a second outer lateral surface that extends downward in the first direction from a bottom of the first outer lateral surface,
• wherein the first outer lateral surface is parallel to the first direction,
• wherein an angle between the second outer lateral surface and a line corresponding to the first direction is an acute angle,
• wherein a top surface of the focus ring has a first inner diameter,
• wherein a bottom surface of the focus ring has a second inner diameter,
• wherein the first inner diameter is smaller than the second inner diameter, and
• wherein a diameter of the chuck is in a range of about 298.6 mm to about 300 mm.

A substrate processing apparatus, comprising:

• an electrostatic chuck structure;
• a focus ring on the electrostatic chuck structure and having a central axis that extends in a first direction;
• and
• an outer ring that at least partially surrounds the focus ring,
• wherein an inner lateral surface of the focus ring comprises a first inner lateral surface and a second inner lateral surface,
• wherein an outer lateral surface of the focus ring comprises a first outer lateral surface and a second outer lateral surface,
• wherein the second inner lateral surface contacts the first inner lateral surface,
• wherein the first inner lateral surface is closer to the electrostatic chuck structure than the second inner lateral surface,
• wherein the second outer lateral surface extends downward in the first direction from a bottom of the first outer lateral surface, and
• wherein the first outer lateral surface is closer to the outer ring than the second outer lateral surface.