Processing chamber, assembly and a method
AssigneeASM IP Holding B.V.
InventorAntti Niskanen
Life of this patent
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Abstract
The current disclosure relates to a semiconductor processing chamber comprising a showerhead, the showerhead comprising a showerplate for providing a reactant into the processing chamber. The processing chamber further comprises a moveable susceptor for holding a substrate; wherein the processing chamber has a showerplate axis extending vertically through the showerplate; a substrate axis extending vertically at a position at which the center of the substrate is configured and arranged to be during providing reactant into the processing chamber; and wherein the substrate axis is offset from the showerhead axis. The disclosure further relates to a semiconductor processing assembly and to a method of treating a semiconductor substrate.
Claims11
A semiconductor processing chamber comprising
- a showerhead comprising a showerplate for providing a reactant into the processing chamber;
- and
- a moveable susceptor for holding a substrate,
- wherein the processing chamber has
- a showerplate axis extending vertically through the showerplate;
- and
- a substrate axis extending vertically at a position at which the center of the substrate is configured and arranged to be during providing reactant into the processing chamber,
- wherein the substrate axis is offset from the showerplate axis,
- wherein the susceptor comprises a susceptor axis that extends through the susceptor, and the susceptor is moveable rotatably about the susceptor axis while being tilted relative to the showerplate axis such that the distance of a surface of the substrate from the showerplate changes during rotation, and
- wherein the substrate axis and the susceptor axis coincide.
Dependencies are inferred from the claim text.