US 12,738,456 B2Granted

Multiple input split ring resonator ion beam source

AssigneeFEI Company

InventorsSean M. Kellogg, John Stiller, James Hendershot

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Abstract

Embodiments of charged particle beam systems, components, and methods for extracting charged particles from a gas are described. In a first aspect, A charged particle source includes a resonator. The resonator can include a dielectric substrate defining a first side and a second side, the second side opposite the first side. The resonator can include a first conductive layer disposed on the first side. The first conductive layer can be disposed in accordance with a pattern comprising a ring portion. The pattern can define a gap in the ring portion of the first conductive layer. The resonator can also include a second conductive layer disposed on the second side. The charged particle source can also include a source electrode. The source electrode can be disposed proximal to the first side. The source electrode can be offset from the dielectric substrate.

Claims20

Dependent claims

A charged particle source, comprising:

a resonator, including:
a dielectric substrate defining a first side and a second side, the second side opposite the first side;
a first conductive layer disposed on the first side, the first conductive layer disposed in accordance with a pattern comprising a ring portion, the pattern defining:
a gap in the ring portion of the first conductive layer;
a first input point in the ring portion at a first fractional position, α, on the ring portion;
and
a second input point in the ring portion at a second fractional position, β, on the ring portion;
and
a second conductive layer disposed on the second side;
and
a source electrode, disposed proximal to the first side, the source electrode defining an aperture, the source electrode being offset from the first conductive layer,
wherein, for a given input point in the ring portion, the fractional position is a ratio of a first path length between the gap and the given input point in a first direction, relative to a second path length between the gap and the given input point in a second direction different from the first direction.

9 more elements

A charged particle beam system, comprising:

a source section, including:
a resonator, including:
a dielectric substrate defining a first side and a second side, the second side opposite the first side;
a first conductive layer disposed on the first side, the first conductive layer disposed in accordance with a pattern comprising a ring portion, the pattern defining:
a gap in the ring portion;
a first input point in the ring portion at a first fractional position, α, relative to the gap;
and
a second input point in the ring portion at a second fractional position, β, relative to the gap;
and
a second conductive layer disposed on the second side;
and
a source electrode, disposed proximal to the first side, the source electrode;
defining an aperture, the source electrode being offset from the first conductive layer;
a focused ion beam (FIB) column, operably coupled with the source section and including multiple charged particle optics;
and
a vacuum chamber, operably coupled with the FIB column.

13 more elements

Dependencies are inferred from the claim text.

Facts

Application: 18/806,556Filed 15 Aug 2024
Published: US 2026/0051458 A119 Feb 2026
Granted: 15 Sep 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification8 codes

H01J 37/32183
Circuits specially adapted for controlling the RF discharge: matching circuits
H05H 1/461
Using applied electromagnetic fields, e.g. high frequency or microwave energy: microwave discharges
H01J 37/321
Radio frequency generated discharge: the radio frequency energy being inductively coupled to the plasma
H01J 37/32577
Electrodes: electrical connecting means