Unidirectional perspective film, single-sided mirror and method for preparing same, and electronic device
AssigneeBYD Company Limited
InventorsXinhai Peng, Yuyang Liu, Jihou Wang, Chao Li, Yuan Li
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Abstract
A unidirectional perspective film includes a first niobium oxide layer, a first silicon oxide layer, an absorption layer, a second niobium oxide layer, and a second silicon oxide layer that are sequentially disposed. The absorption layer has a thickness ranging from 8 nm to 20 nm.
Claims18
A unidirectional perspective film, comprising a plurality of layers which comprise a first niobium oxide layer, a first silicon oxide layer, an absorption layer, a second niobium oxide layer, and a second silicon oxide layer disposed sequentially,
- wherein the unidirectional perspective film comprises an outer side surface and an inner side surface, the outer side surface is disposed on a surface of a substrate, one of the outer side surface and the inner side surface is a niobium oxide layer, and the other one of the outer side surface and the inner side surface is a silicon oxide layer,
- wherein the absorption layer has a thickness ranging from about 8 nm to about 20 nm, and a first number of layers between the surface of the substrate and a first surface of the absorption layer and a second number of layers disposed on a second surface of the absorption layer are the same, wherein the first surface of the absorption layer faces the substrate, and the second surface of the absorption layer faces away from the substrate.
A single-sided mirror, comprising a substrate and an unidirectional perspective film disposed on a surface of the substrate, wherein:
- the unidirectional perspective film comprises a plurality of layers which comprise a first niobium oxide layer, a first silicon oxide layer, an absorption layer, a second niobium oxide layer, and a second silicon oxide layer disposed sequentially, wherein the unidirectional perspective film comprises an outer side surface and an inner side surface, the outer side surface is disposed on a surface of a substrate, one of the outer side surface and the inner side surface is a niobium oxide layer, and the other one of the outer side surface and the inner side surface is a silicon oxide layer,
- wherein the absorption layer has a thickness ranging from about 8 nm to about 20 nm, and a first number of layers between the surface of the substrate and a first surface of the absorption layer and a second number of layers disposed on a second surface of the absorption layer are the same, wherein the first surface of the absorption layer faces the substrate, and the second surface of the absorption layer faces away from the substrate.
An electronic device, comprising a unidirectional perspective film, wherein:
- the unidirectional perspective film comprises a plurality of layers which comprise a first niobium oxide layer, a first silicon oxide layer, an absorption layer, a second niobium oxide layer, and a second silicon oxide layer disposed sequentially, wherein the unidirectional perspective film comprises an outer side surface and an inner side surface, the outer side surface is disposed on a surface of a substrate, one of the outer side surface and the inner side surface is a niobium oxide layer, and the other one of the outer side surface and the inner side surface is a silicon oxide layer,
- the absorption layer has a thickness ranging from about 8 nm to about 20 nm, and a first number of layers between the surface of the substrate and a first surface of the absorption layer and a second number of layers disposed on a second surface of the absorption layer are the same, wherein the first surface of the absorption layer faces the substrate, and the second surface of the absorption layer faces away from the substrate.
Dependencies are inferred from the claim text.