Sensor for detecting gas and gas flow and method for manufacturing sensor element of sensor
AssigneeHongik University Industry-Academia Cooperation Foundation
InventorJung Hwan Seo
Life of this patent
Estimating the term…
Abstract
A sensor element has a substrate, a channel formed in the substrate, and serving as an inlet passage of the gas, a plurality of micro-scale pillars formed in the channel and interfering with the flow of the gas moving through the channel, and a conductive layer formed on a surface of the plurality of pillars by deposition. A sensor has the sensor element, and a metering module electrically connected to the conductive layer, and configured to measure an electrical signal generated by the interference of the plurality of pillars with the flow of the gas.
Claims12
A sensor for detecting a gas and a flow of the gas, comprising:
- a sensor element comprising:
- a substrate,
- a channel formed in the substrate, and serving as an inlet passage of the gas,
- a plurality of micro-scale pillars formed in the channel and interfering with the flow of the gas moving through the channel, and
- a conductive layer formed on a surface of the plurality of pillars by deposition;
- a metering module electrically connected to the conductive layer, and configured to measure an electrical signal generated by the interference of the plurality of pillars with the flow of the gas;
- and
- a processing module configured to process the electrical signal measured from the metering module.
A method for manufacturing a sensor element of a sensor for detecting a gas and a flow of the gas, the method comprising the steps of:
- preparing a substrate;
- forming a masking layer on the substrate;
- removing the masking layer at an area at which a channel will be formed;
- and
- forming a groove in the substrate by etching to form the channel,
- wherein a material of the masking layer etched together during the etching is broken down into nano particles and the nano particles build up in the groove and act as a micro mask,
- wherein a part of the substrate that is not etched by the micro mask form pillars in the channel, and
- wherein a conductive material is deposited on the plurality of pillars to form a conductive layer.
Dependencies are inferred from the claim text.