Apparatus for manufacturing analytical semiconductor samples and method for manufacturing analytical semiconductor samples by using the same

A method for preparing analytical semiconductor samples, the method comprising:

• mounting the analytical semiconductor samples to a holder;
• rotating, through a rotatable support, a polishing plate;
• discharging deionized (DI) water to an upper surface of the polishing plate through a DI water nozzle;
• grinding the analytical semiconductor samples with the upper surface of the polishing plate during the rotating;
• determining whether a desired viewing surface of the analytical semiconductor samples, with respect to a viewing surface image of the ground analytical semiconductor samples, has been acquired after the grinding of the analytical semiconductor samples;
• determining a change of at least one of a tilt direction or a tilt angle based on a determination that the desired viewing surface of the analytical semiconductor samples has not been acquired;
• grinding the analytical semiconductor samples using the changed at least one of the tilt direction or the tilt angle;
• and
• transferring the analytical semiconductor samples to analyze the viewing surface of the ground analytical semiconductor samples based on a determination that the desired viewing surface of the analytical semiconductor samples has been acquired.