Pressure-based sensor system for precursor level measurement and method therefor
AssigneeASM IP Holding B.V.
InventorsKenneth Honniball, Giuseppe Alessio Verni, Viljami Pore
Life of this patent
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Abstract
A pressure-based sensor system is described by which the amount of solid precursor in a precursor vessel for a semiconductor manufacturing process can be determined. The system comprises at least two fluidly connected chambers having a known volume, and a pressure sensor configured to measure a plurality of pressures in said chambers.
Claims20
Method for determining an amount of solid precursor in a pressure-based sensor system for a semiconductor manufacturing process, wherein the system comprises a precursor chamber having a known volume, the precursor chamber configured for receiving and holding the solid precursor and being fluidly connected to a probing chamber that has a known volume, a valve configured to control a flow of a probing gas from said precursor chamber to said probing chamber, and an inlet pipe configured to receive and guide the probing gas, from a probing gas source, into a portion of said precursor chamber holding the solid precursor, wherein the method comprises the steps of:
- providing the probing gas, via the inlet pipe, to the precursor chamber holding the amount of the solid precursor to be measured;
- measuring a first pressure of the probing gas;
- opening said valve such that the probing gas flows from said precursor chamber to said probing chamber;
- measuring an equilibrium pressure of the probing gas;
- and
- determining the amount of the solid precursor in the system based on:
- the measured first pressure, the measured equilibrium pressure, a volume of the inlet pipe, and an extrapolated value from a calibration curve describing a relationship between a volume of the solid precursor contained in the precursor chamber and the amount of the solid precursor.
Pressure-based sensor system for measuring an amount of solid or liquid precursor therein for a semiconductor manufacturing process, the system comprising:
- a precursor chamber having a known volume, which is configured for receiving and holding the precursor;
- a probing chamber having a known volume, which is fluidly connected to said precursor chamber;
- a probing gas source configured to provide a probing gas to said precursor chamber;
- an inlet pipe configured to receive and guide probing gas from the probing gas source into a portion of said precursor chamber holding the precursor;
- a valve configured to control a flow of probing gas from said precursor chamber to said probing chamber;
- a pressure sensor configured to measure a pressure of the probing gas;
- and
- a processing device communicatively coupled to said pressure sensor in order to receive sensing data therefrom and configured to determine, based on said sensing data, the amount of precursor in the system based:
- on a plurality of pressure measurements, an extrapolated value from a calibration curve describing a relationship between a volume of the precursor contained in said precursor chamber and the amount of precursor, and known chamber volumes including a volume of the inlet pipe based on length and diameter of the inlet pipe,
- wherein said plurality of pressure measurements includes at least a first measurement when the probing gas is provided to said precursor chamber, and a second measurement when said probing gas reaches equilibrium pressure in said precursor chamber and said probing chamber.
Dependencies are inferred from the claim text.