Quartz glass crucible, manufacturing method thereof, and manufacturing method of silicon single crystal

A quartz glass crucible comprising:

• a crucible base body consisting of silica glass;
• and
• a coating film containing a crystallization accelerator and formed on an inner surface of the crucible base body,
• wherein:
• the coating film has an average carbon concentration of 1.0×1012 atoms/cc or more and 3.0×1019 atoms/cc or less,
• the crucible base body at a depth from 0 μm to 300 μm from the inner surface of the crucible base body has an average carbon concentration of 1.0×1012 atoms/cc or more and 3.0×1019 atoms/cc or less,
• a variation coefficient (σ/AVERAGE) of a carbon concentration in the coating film at five points on a bottom of the crucible base body is 1.1 or less, and
• the five points are determined as:
• a first measurement point that is a center of the bottom,
• a second measurement point that is a position shifted by 0.08 to 0.7 times a radius in a radial direction of the crucible base body from the first measurement point,
• a third measurement point that is a position rotated 90° clockwise in a circumferential direction from the second measurement point,
• a fourth measurement point is a position rotated 90° clockwise in the circumferential direction from the third measurement point, and
• a fifth measurement point that is a position rotated 90° clockwise in the circumferential direction from the fourth measurement point.