Group 2 metal containing film forming compositions and vapor deposition of the films using the same
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsDaehyeon Kim, Jooho Lee, Wontae Noh
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Abstract
A method of forming Group 2 metal containing films on a substrate comprises a) exposing the substrate to a vapor of a Group 2 metal containing film forming composition that contains an alkaline earth metal precursor having the formula: wherein M is Be, Mg, Ca, Sr, or Ba; R1-R6 each independently are a C1-C10 alkyl group, a fluoro group, an alkylsilyl group, a germyl group, an alkylamide or an alkylsilylamide, b) depositing at least part of the alkaline earth metal precursor onto the substrate to form a Group 2 metal-containing film through a vapor deposition process; and c) repeating a) and b) until a desired thickness of the Group 2 metal-containing film is formed.
Claims19
A method of forming a Group 2 metal containing film on a substrate, the method comprising
- a) exposing the substrate to a vapor of a Group 2 metal containing film forming composition that contains Group 2 metal precursor selected from the group consisting of Bis (tri-sec-butyl cyclopentadienyl) Strontium (II), Sr(sBu3Cp)2, Bis (tri-sec-butyl cyclopentadienyl) Barium (II), Ba(sBu3Cp)2, Bis (tri-iso-propyl cyclopentadienyl) Strontium (II), Sr(iPr3Cp)2, Bis (tri-tert-butyl cyclopentadienyl) Strontium (II), Sr(tBu3Cp)2, Bis (tri-iso-propyl and cyclopentadienyl) Barium (II), Ba(iPr3Cp)2,
- b) depositing at least part of the Group 2 metal precursor onto the substrate to form the Group 2 metal-containing film through a vapor deposition process;
- and
- c) repeating a) and b) until a desired thickness of the Group 2 metal-containing film is formed.
A method of depositing a SrO film on a substrate, the method comprising the steps of:
- a) exposing the substrate to a vapor of Bis (tri-sec-butyl cyclopentadienyl) Strontium (II), Sr (sBu3Cp)2;
- b) exposing the substrate to a co-reactant H2O;
- c) depositing at least part of the Bis (tri-sec-butyl cyclopentadienyl) Strontium (II), Sr (sBu3Cp)2 metal precursor onto the substrate to form the SrO film through a vapor deposition process;
- and
- d) repeating a)-c) until a desired thickness of the SrO film is formed.
A method of depositing a BaO film on a substrate, the method comprising the steps of:
- a) exposing the substrate to a vapor of Bis (tri-sec-butyl cyclopentadienyl) Barium (II), Ba (sBu3Cp)2;
- b) exposing the substrate to a co-reactant H2O;
- c) depositing at least part of the Bis (tri-sec-butyl cyclopentadienyl) Barium (II), Ba(sBu3Cp)2 metal precursor onto the substrate to form the BaO film through a vapor deposition process;
- and
- d) repeating a)-c) until a desired thickness of the BaO film is formed.
Dependencies are inferred from the claim text.