Hydrogen production apparatus, hydrogen production method, silicon fine particles for hydrogen production, and production method for silicon fine particles for hydrogen production

A production method for silicon fine particles for hydrogen production, the method comprising:

• a surface oxide film removing step of causing silicon fine particles having a crystallite diameter of 100 nm or less to contact with an aqueous hydrofluoric acid solution or an aqueous ammonium fluoride solution;
• a hydrophilization treatment step of hydrophilizing surfaces of the silicon fine particles having been caused to contact with the aqueous hydrofluoric acid solution or the aqueous ammonium fluoride solution;
• and
• an additional surface oxide film removing step, to be executed during or after a hydrogen generating step of generating hydrogen by causing the silicon fine particles to contact with as well as disperse in, or to contact with or dispersed in water or an aqueous solution, of causing the silicon fine particles to contact again with the aqueous hydrofluoric acid solution or the aqueous ammonium fluoride solution.

A hydrogen production method comprising:

• a grinding step of grinding a silicon chip or a silicon grinding scrap to form silicon fine particles;
• a surface oxide film removing step of causing the silicon fine particles formed in the grinding step to contact with an aqueous hydrofluoric acid solution or an aqueous ammonium fluoride solution;
• a hydrophilization treatment step of hydrophilizing surfaces of the silicon fine particles having been caused to contact with the aqueous hydrofluoric acid solution or the aqueous ammonium fluoride solution;
• and
• a hydrogen generating step of generating hydrogen by causing the silicon fine particles to contact with as well as disperse in, or to contact with or dispersed in water or an aqueous solution.