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US 12,733,486 B2Granted
Inductor performance enhancement using an outer, peripheral patterned ground shield
AssigneeQUALCOMM Incorporated
InventorsJonghae Kim, Je-Hsiung Lan, Ranadeep Dutta
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Abstract
A device is described, in which the device includes a substrate. The device includes a multiturn inductor coupled to the substrate. The device also includes a patterned ground shield on a periphery of the multiturn inductor and coupled to the substrate.
Claims19
A device, comprising:
- a substrate having an active device layer;
- a multiturn inductor comprised of first back-end-of-line (BEOL) metal layers above the active device layer of the substrate;
- and
- a patterned ground shield on a periphery of the multiturn inductor and comprised of second BEOL metal layers coupled to the first BEOL metal layers and the active device layer of the substrate.
1 more element
A method for fabricating a device having a patterned ground shield on a periphery of a multiturn inductor, comprising:
- forming an active device layer in a substrate;
- forming the patterned ground shield from first back-end-of-line (BEOL) layers coupled to the active layer of the substrate;
- and
- forming the multiturn inductor from second BEOL layers coupled to the first BEOL layers, in which the patterned ground shield is formed on the periphery of the multiturn inductor.
1 more element
Dependencies are inferred from the claim text.