Apparatus of cleaning substrate, apparatus of semiconductor device and method for manufacturing a semiconductor package using the same
AssigneesSamsung Electronics Co., Ltd., Semes Co., Ltd.
InventorsHyo Shin Lim, Ho Jun Lee
Life of this patent
Estimating the term…
Abstract
A substrate cleaning apparatus may include a steam injector configured to clean a substrate, a steam supplier configured to supply a steam, and a gas supplier configured to supply a gas. The steam injector may include a drive unit configured to move horizontally, a plate on the drive unit, and a plurality of nozzles on the plate. The plate may include a temperature sensor, a first pressure sensor, and a second pressure sensor. Each of the plurality of nozzles may be connected to the steam supplier and the gas supplier. The plurality of nozzles may be arranged in one direction from a planar viewpoint.
Claims12
A substrate cleaning apparatus comprising:
- a steam injector configured to clean a substrate;
- a steam supplier configured to supply a steam;
- and
- a gas supplier configured to supply a gas, wherein
- the steam injector includes a drive unit configured to move horizontally, a plate on the drive unit, and a plurality of nozzles on the plate,
- the plate includes a temperature sensor, a first pressure sensor, and a second pressure sensor,
- each of the plurality of nozzles is connected to the steam supplier and the gas supplier, and
- the plurality of nozzles are arranged in a first direction from a planar viewpoint.
Dependencies are inferred from the claim text.