Process for fabricating an optoelectronic device comprising a step of producing a thin conductive layer conformally and continuously by directional deposition

Method A manufacturing method for manufacturing an optoelectronic device comprising:

• a substrate, and a plurality of wire diodes for emitting or detecting light resting on the substrate, each having an average height h and being spaced apart with an average relative spacing d from side to side, such that an h:d spacing aspect ratio is at least equal to 1, the method comprising:
• producing a lower conductive thin film, made of at least one electrically conductive material, to form a lower electrode by performing directional physical vapour deposition in a main deposition direction oriented towards the substrate and the wire diodes, resulting in an incident material flow of the electrically conductive material,
• wherein the substrate rests on a support of a substrate holder, the support experiencing a periodic rotational movement so that sides of the wire diodes are exposed to the incident material flow at a rotation frequency, and a periodic oscillation movement of an angle of inclination formed between a main axis orthogonal to the substrate and a fixed axis parallel to the main deposition direction ranging at most up to a threshold value equal to arctan and including the value 0°, at an angular oscillation frequency;
• and
• the frequencies of rotation and of angular oscillation being predefined so that the lower conductive thin film is deposited on the substrate and the sides of the wire diodes in a conformal and continuous manner.