Semiconductor device and method for fabricating the same

A semiconductor device, comprising:

• a vertical conductive line;
• a horizontal layer oriented horizontally from the vertical conductive line;
• a horizontal conductive line crossing the horizontal layer;
• and
• a data storage element in contact with the horizontal layer,
• wherein the data storage element includes:
• a first electrode including a first cylinder that is in contact with an edge of an upper portion of the horizontal layer and a second cylinder that is in contact with an edge of a lower portion of the horizontal layer;
• double contact nodes respectively in contact with the first cylinder and the second cylinder and disposed on the edge of the upper portion and the edge of the lower portion of the horizontal layer;
• a second electrode disposed over the first electrode;
• and
• a dielectric layer between the first electrode and the second electrode, and
• the second electrode includes:
• a sharing portion disposed in a gap between the first cylinder and the second cylinder;
• inner portions disposed on an inner surface of the first cylinder and an inner surface of the second cylinder;
• and
• outer portions disposed over the first cylinder and below the second cylinder.