Loading patent…
AssigneeApplied Materials, Inc.
InventorsAmita Joshi, Andrew Ceballos, Kenichi Ohno, Rami Hourani, Ludovic Godet
Estimating the term…
Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more silicon-containing compounds.
An imprint composition, comprising:
An imprint composition, comprising:
An imprint composition, comprising:
Dependencies are inferred from the claim text.