Distortion resistance film and pressure sensor
AssigneeTDK Corporation
InventorsKohei Nawaoka, Ken Unno, Tetsuya Sasahara, Masanori Kobayashi
Life of this patent
Estimating the term…
Abstract
A distortion resistance film is capable of reducing a property change accompanying a composition change and a pressure sensor uses the distortion resistance film. The distortion resistance film is represented by a formula Cr100-x-yAlxNy, in which composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.
Claims8
A distortion resistance film comprising a composition represented by a formula Cr100-x-yAlxNy, wherein composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.
A distortion resistance film comprising a composition represented by a formula Cr100-x-yAlxNy,
- wherein composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively, and
- wherein, in a case where a temperature calibration of a resistance value is performed in a low temperature region, a relationship between a temperature calibration straight line of a resistance value and a resistance temperature straight line of a distortion resistance film is 0.8 or more in a coefficient R2 of determination.
Dependencies are inferred from the claim text.