Methods for coating a substrate with magnesium fluoride via atomic layer deposition
AssigneeCorning Incorporated
InventorsMing-Huang Huang, Hoon Kim, Jue Wang
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Abstract
Atomic layer deposition methods for coating an optical substrate with magnesium fluoride. The methods include two primary processes. The first process includes the formation of a magnesium oxide layer over a surface of a substrate. The second process includes converting the magnesium oxide layer to a magnesium fluoride layer. These two primary processes may be repeated a plurality of times to create multiple magnesium fluoride layers that make up a magnesium fluoride film. The magnesium fluoride film may serve as an antireflective coating layer for an optical substrate, such as an optical lens.
Claims19
An optical element, comprising:
- an optically transparent lens comprising a first surface having a steepness value in a range of 0.5 to 1.0 and a second surface opposite the first surface, wherein the steepness value is equal to a radius of curvature of the first surface divided by a clear aperture of the optically transparent lens;
- and
- an optical film disposed over at least one of the first surface and the second surface, the optical film comprising:
- a first index layer comprising a first index of refraction for light having a wavelength of 550 nanometers, and
- a second index layer disposed over the first index layer and comprising a magnesium fluoride film and a low index layer, wherein the second index layer comprises a second index of refraction for light having a wavelength of 550 nanometers, wherein the second index of refraction is smaller than the first index of refraction, and wherein the magnesium fluoride film comprises an optical absorption value of 1% or less for light having a wavelength of 266 nanometers and an incident angle of 6 degrees.
Dependencies are inferred from the claim text.