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AssigneeMax-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
InventorsJohannes Arnoldus Boschker, Wolfgang Braun
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The present invention relates to a laser system (10) for evaporating and/or sublimating a material (124) of a source (120) located in a reaction chamber (110) of an evaporation system (100), the laser system (10) comprising a laser light source (12) for providing a laser beam (16) and a guidance means (14) for guiding the laser beam (16) towards an initial spot (20) on a surface (122) of the source (120). In addition, the invention relates to an evaporation system (100) for coating a substrate (130) with evaporated and/or sublimated material (124) of a source (120), comprising a reaction chamber (110) with a reaction volume (114) for arranging the source (120) and the substrate (130), and a laser system (10) for evaporating and/or sublimating the material (124) of the source (120).
Laser system for evaporating and/or sublimating a material of a source located in a reaction chamber of an evaporation system, the laser system comprising a laser light source for providing a laser beam and a guidance means for guiding the laser beam towards an initial spot on a surface of the source, wherein the laser system comprises a mirror assembly with one or more mirrors for reflecting a reflected laser beam reflected at the surface of the source back towards the surface of the source.
Evaporation system for coating a substrate with evaporated and/or sublimated material of a source, comprising a reaction chamber with a reaction volume for arranging the source and the substrate, and a laser system for evaporating and/or sublimating the material of the source,
Dependencies are inferred from the claim text.