Anti-reflection substrate

An antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order:

• a substrate layer (A),
• a hard coating layer (B),
• a light absorbing layer (C), and
• a low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, wherein
• a film thickness of the light absorbing layer (C) is 2 to 15 nm,
• wherein the light absorbing layer (C) is formed by a dry film formation selected from CVD and PVD,
• the active energy ray-curable resin in the low refractive index layer (D) contains a urethane (meth)acrylate component,
• the fluorine compound in the low refractive index layer (D) has a perfluoropolyether bond, and
• the light absorbing layer (C) is formed from at least one selected from the group consisting of titanium nitride, titanium oxynitride, zirconium nitride, gold, silver, and copper.