Plasma-resistant ceramic substrate and method of manufacturing the same

Abstract

The present invention provides a plasma-resistant ceramic substrate including a bulk of an oxide composition; and a surface layer in which an oxide composition component constituting the bulk was modified to a composition including one or more anions selected from the group consisting of F− and Cl−, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F− and Cl− is vaporized by heating and adsorbed on the surface of the ceramic substrate to be modified to a composition including one or more anions selected from the group consisting of F− and Cl−, and a method of manufacturing the same. According to the present invention, the plasma resistance and durability of the ceramic substrate can be improved at low cost.

Dependencies are inferred from the claim text.