Production device for pH/redox potential-adjusted water

A production device for adjusted water having pH and redox potential that produces adjusted water having a desired pH and a desired redox potential by adding a pH adjuster and a redox potential adjuster to ultrapure water, comprising:

• a hydrogen peroxide removal mechanism provided in an ultrapure water supply line;
• a pH adjuster addition mechanism and a redox potential adjuster addition mechanism that are provided downstream of the hydrogen peroxide removal mechanism;
• a degassing mechanism provided downstream of the pH adjuster addition mechanism and/or the redox potential adjuster addition mechanism;
• and
• an inert gas dissolution mechanism provided downstream of the degassing mechanism, wherein the produced adjusted water having pH and redox potential has a pH of 0 to 5, a redox potential of −0.4 to +0.4 V, a dissolved oxygen concentration of 50 ppb or less, and a hydrogen peroxide concentration of 1000 ppm or less, and the production device further comprising:
• a water quality monitoring mechanism configured for monitoring the pH, redox potential, and inert gas concentration of the adjusted water to determine whether or not the adjusted water has the desired pH and the desired redox potential;
• and
• a control device capable of stabilized control of the inert gas dissolution mechanism, the pH adjuster addition mechanism, and the redox potential adjuster addition mechanism based on measurements from the water quality monitoring mechanism so that the inert gas dissolution mechanism adjusts the inert gas concentration, the pH adjuster addition mechanism adjusts the pH, and the redox potential adjuster addition mechanism adjusts the redox potential,
• wherein the adjusted water having pH and redox potential produced is suitable for cleaning a semiconductor material on which molybdenum is partially or entirely exposed.