Wafer processing method
AssigneeDisco Corporation
InventorsTomoharu Takita, Hayato Kiuchi
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AssigneeDisco Corporation
InventorsTomoharu Takita, Hayato Kiuchi
Estimating the term…
A wafer processing method for processing a wafer which has one side in which a circular recessed portion is formed in a region surrounded by an annular protruding portion is performed by a thermocompression bonding apparatus including a first recessed portion, a second recessed portion, and a holding table that is disposed on the second recessed portion. In the method, the wafer the one side of which is oriented upward is held from a lower side by the holding table, a sheet is sandwiched by the first recessed portion and the second recessed portion, the first recessed portion is depressurized while the second recessed portion is depressurized, pressure inside the first recessed portion is increased, the sheet is caused to come into contact with the one side of the wafer, and the sheet is heated, to thermocompression-bond the sheet to the one side of the wafer.
A wafer processing method for processing a wafer that has one side in which an annular protruding portion is provided on an outer circumferential portion thereof and a circular recessed portion is formed in a region surrounded by the annular protruding portion, by a thermocompression bonding apparatus that includes an upper chamber including a first recessed portion that is coupled to a first depressurizing unit and that has a first opening, a lower chamber including a second recessed portion that is coupled to a second depressurizing unit and that has a second opening, and a holding table that is disposed on the second recessed portion and that holds the wafer, the upper chamber and the lower chamber being closed by the first opening and the second opening being fit together, the wafer processing method comprising:
Dependencies are inferred from the claim text.